The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Aug. 11, 2008
John C. Hoffman, Chestnut Ridge, NY (US);
John C. Hoffman, Chestnut Ridge, NY (US);
Other;
Abstract
A gas diffusion vacuum device includes a supply of gas, a nonpermeable enclosure, a supply of liquid, an open liquid reservoir and a gas permeable cover. A first end of the nonpermeable enclosure is retained in the open liquid reservoir. The volume of gas is supplied through a side wall of the nonpermeable enclosure. The gas is preferably carbon dioxide. The gas permeable cover preferably includes a diffusion barrier and a porous diffusion barrier support. The diffusion barrier is wrapped over the porous diffusion barrier support and secured to a side wall of the nonpermeable enclosure. As the gas diffuses through the gas permeable cover, a vacuum is created to raise a column of liquid. A second embodiment of the gas diffusion vacuum device includes a supply of gas, a nonpermeable enclosure and a gas permeable cover. A vacuum created is used to perform work with an air driven device.