The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Jul. 11, 2006
Applicants:
Min-shu Wang, Taipei, TW;
Chun-you Wang, Taipei, TW;
Chun-chih Yang, Taipei, TW;
Inventors:
Assignee:
Via Technologies, Inc., Taipei, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides a method of test pattern generation for an integrated circuit (IC) design simulation system, comprising merging at least 2 test vectors into a merged vector, wherein each test defines a set of test behaviors, and compiling and linking the merged vector using the IC design simulation system to generate a merged test pattern able to perform each set of test behaviors independently.
Wang, Min-Shu. (2009). Method of test pattern generation in ic design simulation system (U.S. Patent No. 7526703). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7526703
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile