The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Aug. 10, 2006
Ayako Kadono, Utsunomiya, JP;
Haruna Kawashima, Haga-gun, JP;
Ayako Kadono, Utsunomiya, JP;
Haruna Kawashima, Haga-gun, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a reticle stage for supporting a reticle, an illumination optical system for illuminating the reticle, a projection optical system for projecting an image of a pattern of the reticle onto a substrate, a polarization state measuring part for measuring a polarization state, and an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination optical system to the polarization state measuring part, wherein said polarization state measuring part includes a phase shifter, a polarization element, and a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile