The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Dec. 14, 2006
Puneet Kohli, Dallas, TX (US);
Manoj Mehrotra, Plano, TX (US);
Jin Zhao, Plano, TX (US);
Sameer Ajmera, Richardson, TX (US);
Puneet Kohli, Dallas, TX (US);
Manoj Mehrotra, Plano, TX (US);
Jin Zhao, Plano, TX (US);
Sameer Ajmera, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The invention provides a method for manufacturing a semiconductor device. The method for manufacturing the semiconductor device, among others, may include forming one or more layers of material within an opening in a substrate, the opening and the one or more layers forming at least a portion of an isolation structure, and subjecting at least one of the one or more layers to an energy beam treatment, the energy beam treatment configured to change a stress of the one or more layers subjected thereto, and thus change a stress in the substrate.