The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Mar. 28, 2006
Chiung-wei Lin, Taipei, TW;
Chein-fu Teng, Taipei, TW;
Yi-liang Chen, Taipei, TW;
Tatung Company, Taipei, TW;
Tatung University, Taipei, TW;
Abstract
The present invention is to provide an anti-reflective substrate, and the manufacturing method of the substrate. The method comprises the steps of: (a) providing a substrate; (b) depositing an amorphous silicon layer on the substrate; and (c) etching the amorphous silicon layer and the substrate by chemical etching in solutions, and the amorphous silicon layer is removed by the solutions. The effective reflectance of the anti-reflective substrate produced from the method of the present invention can be lower than 1%, and the absorption rate of the anti-reflective substrate is preferably from 70% to 90% in a wavelength range of 300 nm-900 nm.