The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
May. 14, 2002
Yvon Pellegrin, Montpellier, FR;
Yvon Pellegrin, Montpellier, FR;
Semco Engineering SA, Montpellier, FR;
Abstract
Method and device for doping or diffusion, or oxidation of silicon wafers (), the wafers being introduced into the chamber () of an oven () wherein is introduced at least a gas for performing the doping or diffusion or oxidation process. The method comprises simultaneously with the introduction and passage of gas into the chamber () of the oven (), continuously subjecting the latter to a depression of constant value. The device comprises an oven () provided with a chamber () wherein are introduced the wafers, the oven including at least an inlet tube () for introducing at least a gas into the chamber () to carry out the processes and at least an outlet tube () for extracting the gas whereto is connected a suction unit () for generating in the chamber () a constant and controlled depression.