The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Aug. 21, 2007
Kwang Young Ko, Boocheon-si, KR;
Kwang Young Ko, Boocheon-si, KR;
Dongbu Hitek Co., Ltd., Seoul, KR;
Abstract
A method of fabricating a high voltage CMOS device is provided that does not require a separate mask for forming a photo align key when forming a high voltage deep well region. The method includes forming a relatively thick first oxide film pattern exposing a predetermined region of a semiconductor substrate; forming a second oxide film pattern on the exposed semiconductor substrate; and forming a high voltage deep well region by performing an ion implant and an annealing using the first oxide film pattern as a mask. The second oxide film pattern is diffused by means of the annealing to generate a step on the high voltage deep well region. The step can be used as a photo align key.