The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2009

Filed:

Jan. 12, 2006
Applicants:

Harald Baumann, Osterode/Harz, DE;

Bernd Strehmel, Berlin, DE;

Ulrich Fiebag, Nienstadt, DE;

Friederike Von Gyldenfeldt, Osterode, DE;

Tanja Ebhardt, Osterode, DE;

Ulrike Dallmann, Herzberg, DE;

Dietmar Frank, Northeim, DE;

Inventors:

Harald Baumann, Osterode/Harz, DE;

Bernd Strehmel, Berlin, DE;

Ulrich Fiebag, Nienstadt, DE;

Friederike Von Gyldenfeldt, Osterode, DE;

Tanja Ebhardt, Osterode, DE;

Ulrike Dallmann, Herzberg, DE;

Dietmar Frank, Northeim, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/76 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/40 (2006.01); C08G 77/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).


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