The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
May. 23, 2003
Yasuo Hosoda, Tsurugashima, JP;
Ayumi Mitsumori, Tsurugashima, JP;
Megumi Sato, Tsurugashima, JP;
Masataka Yamaguchi, Tsurugashima, JP;
Tomoaki Izumi, Tsurugashima, JP;
Satoshi Jinno, Yamanashi-ken, JP;
Yoichi Okumura, Yamanashi-ken, JP;
Yasuo Hosoda, Tsurugashima, JP;
Ayumi Mitsumori, Tsurugashima, JP;
Megumi Sato, Tsurugashima, JP;
Masataka Yamaguchi, Tsurugashima, JP;
Tomoaki Izumi, Tsurugashima, JP;
Satoshi Jinno, Yamanashi-ken, JP;
Yoichi Okumura, Yamanashi-ken, JP;
Pioneer Corporation, Tokyo, JP;
Abstract
An information recording medium has an excellent jitter characteristic with a considerable difference in reflectance between prior to and subsequent to recording. The information recording medium includes a recording layer which contains a material having a reflectance which varies by irradiation of a light beam, on which information is recorded as reflectance variations, and a substrate for supporting the recording layer, the recording layer including a metal nitride as a major component. In a method of manufacturing the information recording medium having a recording layer which includes a material having a reflectance which varies by irradiation of a light beam, on which information is recorded as reflectance variations, and the substrate for supporting the recording layer, the recording layer including a metal nitride as a major component, the method includes a recording layer forming step for forming the recording layer by a reactive sputtering method which uses a target comprised of a metal constituting a metal nitride, wherein a flow ratio Ar:Nin an atmosphere including Ar and Nin the recording layer forming step is set within the range of 80:10 to 10:80.