The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2009

Filed:

Dec. 19, 2007
Applicants:

Yoichiro Iwa, Tokyo, JP;

Gaku Takeuchi, Tokyo, JP;

Takao Tanabe, Tokyo, JP;

Inventors:

Yoichiro Iwa, Tokyo, JP;

Gaku Takeuchi, Tokyo, JP;

Takao Tanabe, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is directed to an ophthalmologic apparatus. The apparatus includes a photographing system that illuminates an ocular fundus of a tested eye, and photographs an image of the ocular fundus of the tested eye based on a reflective beam from the ocular fundus, an aberration measurement part for measuring an optical aberration of the tested eye, an aberration compensation device disposed in the photographing system for compensating the aberration of the tested eye based on signals from the aberration measurement part, and a focusing device for substantially focusing corresponding to a refractive power of the tested eye by moving a part of an optical system comprising the photographing system along an optical axis direction.


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