The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Dec. 06, 2005
Hyung-seok OH, Suwon-si, KR;
Jong-heon Kim, Suwon-si, KR;
Hyung-Seok Oh, Suwon-si, KR;
Jong-Heon Kim, Suwon-si, KR;
Samsung SDI Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A shadow mask for a cathode ray tube is formed with a curved surface such that a radius of curvature corresponding to a perpendicular axis which passes through the center of the shadow mask decreases monotonely along the perpendicular axis from the center of the shadow mask and a radius of curvature corresponding to a parallel axis which passes through the center of the shadow mask decreases monotonely along the parallel axis from the center of the shadow mask. The curved surface satisfies the following condition, [0.1RV+0.9RV, 0.9RV+0.1RV]⊂[RH, RH]. RVand RVrespectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the perpendicular axis, and RHand RHrespectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the parallel axis.