The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Aug. 31, 2005
Naoyuki Ochi, Saitama, JP;
Toyohumi Asano, Saitama, JP;
Masahiro Imaizumi, Kita-ku, JP;
Masaru Kudou, Saitama, JP;
Eiichi Nishihara, Kita-ku, JP;
Masahiro Hirano, Ageo, JP;
Kouta Yoshii, Saitama, JP;
Sumio Itimura, Kita-ku, JP;
Makiko Kogo, Saitama, JP;
Naoyuki Ochi, Saitama, JP;
Toyohumi Asano, Saitama, JP;
Masahiro Imaizumi, Kita-ku, JP;
Masaru Kudou, Saitama, JP;
Eiichi Nishihara, Kita-ku, JP;
Masahiro Hirano, Ageo, JP;
Kouta Yoshii, Saitama, JP;
Sumio Itimura, Kita-ku, JP;
Makiko Kogo, Saitama, JP;
Nippon Kayaku Kabushiki Kaisha, Tokyo, JP;
Abstract
To provide a photopolymerization initiator having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. A liquid crystal sealing material comprising (a) a reactive photopolymerization initiator represented by the general formula (1) and (b) a photocurable resin: (wherein R1 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; R2 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; Ar represents an arylene group; R3 represents a hydrogen atom or a methyl group; X and Y respectively represent O or S; and Z is a hydroxyl group or a morpholino group).