The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2009

Filed:

May. 27, 2004
Applicants:

Craig R. Horne, Sunnyvale, CA (US);

William E. Mcgovern, LaFayette, CA (US);

Robert B. Lynch, Livermore, CA (US);

Ronald J. Mosso, Fremont, CA (US);

Inventors:

Craig R. Horne, Sunnyvale, CA (US);

William E. McGovern, LaFayette, CA (US);

Robert B. Lynch, Livermore, CA (US);

Ronald J. Mosso, Fremont, CA (US);

Assignee:

NanoGram Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 8/00 (2006.01); C23C 14/30 (2006.01); B05D 5/12 (2006.01); H01M 8/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Light reactive deposition can be adapted effectively for the deposition of one or more electrochemical cell components. In particular, electrodes, electrolytes, electrical interconnects can be deposited form a reactive flow. In some embodiments, the reactive flow comprises a reactant stream that intersects a light beam to drive a reaction within a light reactive zone to produce product that is deposited on a substrate. The approach is extremely versatile for the production of a range of compositions that are useful in electrochemical cells and fuel cell, in particular. The properties of the materials, including the density and porosity can be adjusted based on the deposition properties and any subsequent processing including, for example, heat treatments.


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