The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7521026 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 21, 2009

Filed:

Dec. 20, 2004
Applicants:

Louis A. Rosocha, Los Alamos, NM (US);

Vincent Ferreri, Westminster, CO (US);

Yongho Kim, Los Alamos, NM (US);

Inventors:

Louis A. Rosocha, Los Alamos, NM (US);

Vincent Ferreri, Westminster, CO (US);

Yongho Kim, Los Alamos, NM (US);

Assignee:

Los Alamos National Security, LLC, Los Alamos, NM (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention comprises a field enhanced electrode package for use in a non-thermal plasma processor. The field enhanced electrode package includes a high voltage electrode and a field-enhancing electrode with a dielectric material layer disposed in-between the high voltage electrode and the field-enhancing electrode. The field-enhancing electrode features at least one raised section that includes at least one injection hole that allows plasma discharge streamers to occur primarily within an injected additive gas.


Find Patent Forward Citations

Quick Actions:

Rosocha, Louis. (2009). Field-enhanced electrodes for additive-injection non-thermal plasma (ntp) processor (U.S. Patent No. 7521026). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7521026

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…