The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Sep. 06, 2005
Brian E. Bottema, Austin, TX (US);
Stephen F. Abraham, Austin, TX (US);
Alex P. Pamatat, Austin, TX (US);
Brian E. Bottema, Austin, TX (US);
Stephen F. Abraham, Austin, TX (US);
Alex P. Pamatat, Austin, TX (US);
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A polish pad () and platen () assembly for use in chemical mechanical polishing of semiconductor devices includes a platen () having a vented endpoint window () with one or more venting passageways (e.g.,) and/or a grooved or channeled platen surface () to prevent air pressure buildup in the air gap () by discharging or venting air through one or more vent pathways () formed in the platen to provide a pathway to ambient or sub-ambient environment. The air permeable construction of the vented endpoint window () provides pressure relief for the air gap () between the pad endpoint window () and the vented endpoint window (), but may also include passages () that are filled with an air permeable hydrophobic material which protects the underlying endpoint detection system () from contamination during cleaning of the platen endpoint window ().