The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2009

Filed:

Jul. 26, 2007
Applicants:

Merle E. Romesberg, Iii, Pittsburgh, PA (US);

Paul S. Nizin, Sugar Land, TX (US);

Ramiro Pino, Pearland, TX (US);

Inventors:

Merle E. Romesberg, III, Pittsburgh, PA (US);

Paul S. Nizin, Sugar Land, TX (US);

Ramiro Pino, Pearland, TX (US);

Assignee:

Best Medical International, Inc., Springfield, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system to provide enhanced computational efficiency in determining dose in a media of varying density from a high-energy radiation-beam for radiation treatment, program product, and related methods are provided. The system can include a radiation treatment planning computer and radiation treatment planning program product adapted to enhance optimization of a radiation treatment plan for delivering radiation to a complex medium defining a patient volume. The program product provides functions including those for predetermining a delivery machine-dependent representation of radiation dose for different electron densities selected over a representative range, predetermining a depth-dependent representation of central axis properties of a pencil beam passing through a complex medium, and determining with constant time computational complexity, radiation dose for each of a plurality of points of interest in a heterogeneous medium having a complex spatial distribution of heterogeneous electron densities by applying the predetermined machine-dependent and depth-dependent representations.


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