The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Mar. 03, 2006
Miyoko Kawashima, Haga-gun, JP;
Miyoko Kawashima, Haga-gun, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a plate to be exposed. A pupil filter has a first area arranged on a light axis of the projection optical system and a second area formed outside of the first area. The mask is one of an alternating phase shift mask and a chromeless phase shift mask, and the pattern of the mask satisfies (p/λ)·NA≧0.65, where p is a half pitch of the pattern, λ is a wavelength of light illuminating the mask, and NA is an image-side numerical aperture of the projection optical system, and in which, at most, 1order light of diffracted light, which is diffracted by the pattern satisfying (p/λ)·NA≧0.65 passes the first area and a part of the diffracted light having one order of at least 2order light passes the second area, and, with respect to the light having one order among the at least 2order light of the diffracted light, a phase of the light that has passed the second area and a phase of the light that has passed an area other than the second area of the pupil filter are inverted with each other.