The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2009

Filed:

Jul. 11, 2006
Applicants:

Yasushi Nagata, Mitaka, JP;

Yuichi Shimizu, Hokuto, JP;

Inventors:

Yasushi Nagata, Mitaka, JP;

Yuichi Shimizu, Hokuto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
Abstract

A manufacturing apparatus for manufacturing an oriented film of a liquid crystal device holding a liquid crystal between a pair of substrates facing each other, includes: a film formation chamber; an evaporation section evaporating an oriented film material on the substrate by a physical vapor deposition, and forming the oriented film in the film formation chamber; a shielding plate formed between the evaporation section and the substrate, having an elongated opening for selectively evaporating the oriented film material, and covering an area of the substrate on which the oriented film is not formed; and a cleaning section providing a cleaning medium for removing the oriented film material adhered on the shielding plate, toward the opening of the shielding plate, and on the side of the shielding plate that faces the evaporation section.


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