The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Sep. 30, 2005
Applicant:
Shouquan Huo, Webster, NY (US);
Inventor:
Shouquan Huo, Webster, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for forming a facial tris-cyclometallated iridium or rhodium complex isomer comprises heating an original composition containing (a) a meridional isomer of a tris-cyclometallated iridium or rhodium complex in (b) an organic hydrocarbon solvent, a halogenated hydrocarbon solvent, or a combination thereof, to a reaction temperature of least 150° C. for a time sufficient to form a product containing the facial isomer in an increased ratio to meridional isomer compared to the original composition. The process is simple and efficient and provides improved purity.