The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Dec. 19, 2006
Dong-youn Shin, Daegu-si, KR;
Dong-soo Kim, Daejeon-si, KR;
Chung-hwan Kim, Seoul, KR;
Taik-min Lee, Daejeon-si, KR;
Jeong-dai JO, Daejeon-si, KR;
Byung-oh Choi, Daejeon-si, KR;
Dong-Youn Shin, Daegu-si, KR;
Dong-Soo Kim, Daejeon-si, KR;
Chung-Hwan Kim, Seoul, KR;
Taik-Min Lee, Daejeon-si, KR;
Jeong-Dai Jo, Daejeon-si, KR;
Byung-Oh Choi, Daejeon-si, KR;
Abstract
Disclosed herein is a method of forming a pattern, comprising: attaching a single-layer or multi-layer sacrificial film made of a semi-solid or solid material on part or all of the surface of a substrate; irradiating the sacrificial film with a focusable energy beam such as a laser beam to form a region to be charged with a functional material; charging the functional material into the formed region using a method such as an inkjet; drying the functional material; and removing the sacrificial film, thus obtaining the desired pattern.