The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Dec. 26, 2007
Applicants:
Christian Rene Bonhote, San Jose, CA (US);
Dan Saylor Kercher, Santa Cruz, CA (US);
Jeffrey S. Lille, Sunnyvale, CA (US);
Inventors:
Christian Rene Bonhote, San Jose, CA (US);
Dan Saylor Kercher, Santa Cruz, CA (US);
Jeffrey S. Lille, Sunnyvale, CA (US);
Assignee:
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A perpendicular write pole having dual gap layers is disclosed. An outer gap layer, resistant to etching and corrosion in alkaline solutions protects the inner gap layer during photo resist development. An inner gap layer, resistant to acid etch conditions, protects the magnetic pole materials during removal of portions of the outer gap layer prior to electroplating of the pole to form the flare point.