The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Feb. 09, 2006
Robert Kuo-chang Yang, San Jose, CA (US);
Robert Kuo-Chang Yang, San Jose, CA (US);
Other;
Abstract
One or more vertical DMOS transistors, such as trench FETS, are formed between opposing floating poly-filled trench portions. The opposing trench portions may include two parallel trenches, rectangular trenches, hexagonal trenches, octagonal trenches, circular trenches, or other shapes. The floating trench portions are capacitively coupled to assume a potential somewhere between the high drain voltage (below the trenches) and the body voltage (near the top of the trenches). The floating trench portions will have a potential below the drift region and deplete the drift region. The depletion regions caused by the opposing trench portions will merge under the gate with a sufficiently high drain voltage. The electric field lines in the drift region will be shaped to increase the breakdown voltage of the device.