The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Mar. 01, 2005
Sajan Marokkey, Wappingers Falls, NY (US);
O Seo Park, Hopewell Junction, NY (US);
Wai-kin LI, Poughkeepsie, NY (US);
Todd C. Bailey, Fishkill, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
O Seo Park, Hopewell Junction, NY (US);
Wai-Kin Li, Poughkeepsie, NY (US);
Todd C. Bailey, Fishkill, NY (US);
Infineon Technologies AG, Munich, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of preventing resist line collapse in damascene structures and a structure thereof is disclosed. A damascene pattern for resist lines is enhanced with ribs extending therefrom. The ribs provide mechanical support for resist lines and improve the lithography process for forming the resist lines, particularly when a negative focus is used. The ribs may extend between vias in an underlying material layer. The method results in structurally strong resist lines for damascene structures that are less likely to collapse.