The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2009

Filed:

Apr. 11, 2003
Applicants:

Mukesh Kapila, The Woodlands, TX (US);

Glenn Antle, Houston, TX (US);

Zoran Markanovic, Halifax, CA;

Paul Gover, Houston, TX (US);

Robert Hood, Falmouth, CA;

Arthur Martin, Holyrood, CA;

Inventors:

Mukesh Kapila, The Woodlands, TX (US);

Glenn Antle, Houston, TX (US);

Zoran Markanovic, Halifax, CA;

Paul Gover, Houston, TX (US);

Robert Hood, Falmouth, CA;

Arthur Martin, Holyrood, CA;

Assignee:

M-I L.L.C., Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L 2/04 (2006.01); F23B 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved thermal phase separation unit separates contaminants from a contaminated substrate. The improved thermal phase separation unit includes an enclosure arranged to withstand temperatures created by a combustion system, an essentially air-tight processing chamber supported within the enclosure by support columns connected between the processing chamber and a bottom of the enclosure, a heat shield disposed between the processing chamber and the bottom of the enclosure, and a vapor handling system arranged to remove vapor from the processing chamber. The combustion system heats the processing chamber, and, in turn, indirectly heats contaminated substrate being processed in the processing chamber so as to volatize contaminants in the contaminated substrate to vapor that is subsequently removed by the vapor handling system.


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