The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Jan. 17, 2003
Craig S. Corcoran, Rockford, IL (US);
Cindy Chia-wen Chiu, San Dimas, CA (US);
William J. Jaecklein, Mentor, OH (US);
Dong-tsai Hseih, Arcadia, CA (US);
Eng-pi Chang, Arcadia, CA (US);
Le-hoa Hong, Monterey Park, CA (US);
Zhisong Huang, San Dimas, CA (US);
Michael Lang, Chagrin Falls, OH (US);
Ronald Sieloff, Chardon, OH (US);
Philip Yi Zhi Chu, Monrovia, CA (US);
Craig S. Corcoran, Rockford, IL (US);
Cindy Chia-Wen Chiu, San Dimas, CA (US);
William J. Jaecklein, Mentor, OH (US);
Dong-Tsai Hseih, Arcadia, CA (US);
Eng-Pi Chang, Arcadia, CA (US);
Le-Hoa Hong, Monterey Park, CA (US);
Zhisong Huang, San Dimas, CA (US);
Michael Lang, Chagrin Falls, OH (US);
Ronald Sieloff, Chardon, OH (US);
Philip Yi Zhi Chu, Monrovia, CA (US);
Avery Dennison Corporation, Pasadena, CA (US);
Abstract
A microchamber structure () comprising a base layer (), a lid layer (), and at least one microchamber () having a cross-sectional shape with a depth (d) of less than 1000 microns and a width (w) of less than 1000 microns. The base layer () includes a depression () and the lid layer () includes a projection () positioned within the depression () to together define the cross-sectional shape of the microchamber ().