The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Mar. 16, 2006
Niraj Mahadev, Milpitas, CA (US);
Winston Jose, San Jose, CA (US);
Kazumasa Yasuda, Sunnyvale, CA (US);
Rudy Ayala, San Jose, CA (US);
Tam Nguyen, San Jose, CA (US);
Niraj Mahadev, Milpitas, CA (US);
Winston Jose, San Jose, CA (US);
Kazumasa Yasuda, Sunnyvale, CA (US);
Rudy Ayala, San Jose, CA (US);
Tam Nguyen, San Jose, CA (US);
SAE Magnetics (H.K.) Ltd., Shatin, N.T., HK;
Abstract
A system and method for producing micro-texture on a slider substrate using chemical & mechanical polishing techniques is described. In certain embodiments of the present invention, this is accomplished by a method comprising formulating an abrasive slurry solution of predetermined acidity (or pH value), treating a chemical mechanical polishing pad with the abrasive slurry, disposing magnetic heads on the chemical mechanical polishing pad and lapping and grinding the magnetic heads for a predetermined period of time. In certain embodiment of the present invention the lapping and grinding of the magnetic heads are accomplished using an apparatus comprising an abrasive slurry solution of predetermined acidity (pH value), a chemical mechanical polishing pad treated with the abrasive slurry solution, wherein the magnetic heads are attached to a fixture capable of disposing the heads on the chemical mechanical polishing pad.