The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2009

Filed:

Dec. 20, 2006
Applicants:

Jiankang Bu, Windham, ME (US);

William S. Belcher, Cape Elizabeth, ME (US);

Inventors:

Jiankang Bu, Windham, ME (US);

William S. Belcher, Cape Elizabeth, ME (US);

Assignee:

National Semiconductor Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 31/00 (2006.01); G01N 9/36 (2006.01); G06F 19/00 (2006.01); G06F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method are disclosed for very accurately determining a value of a substrate doping density in a metal oxide semiconductor device. A plurality of values of threshold voltage of a device under test are measured using a plurality of different values of source to substrate bias voltage. Then a linear relationship is determined between the plurality of values of threshold voltage and a plurality of different values of an expression that is a function of the source to substrate bias voltage and a function of a surface potential of the device. A very accurate value of the substrate doping density is reiteratively calculated from the linear relationship without assuming that the surface potential of the device has a constant value.


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