The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7511888 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 31, 2009

Filed:

May. 26, 2005
Applicant:

Yoshiyuki Sekine, Utsunomiya, JP;

Inventor:

Yoshiyuki Sekine, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A projection optical system having a multilayered film mirror arranged to provide an approximately uniform reflectance throughout a predetermined light incidence angle range to thereby assure a desired optical performance. A projection exposure apparatus having such a projection optical system, and a device manufacturing method using such an exposure apparatus. A non-periodic film is used in a reflection multilayered film upon a mirror having a largest light incidence angle range or a mirror having a largest average of light incidence angle, and this effectively reduces a pupil transmittance distribution in the projection optical system.


Find Patent Forward Citations

Sekine, Yoshiyuki. (2009). Projection optical system, exposure apparatus, device manufacturing method, and device manufactured by using the same (U.S. Patent No. 7511888). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7511888

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…