The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2009

Filed:

Sep. 08, 2004
Applicants:

Yoshikazu Nakayama, Hirakata, Osaka, JP;

Takashi Okawa, Osaka, JP;

Shigenobu Yamanaka, Osaka, JP;

Akio Harada, Osaka, JP;

Inventors:

Yoshikazu Nakayama, Hirakata, Osaka, JP;

Takashi Okawa, Osaka, JP;

Shigenobu Yamanaka, Osaka, JP;

Akio Harada, Osaka, JP;

Assignees:

Other;

Daiken Chemical Co., Ltd., Osaka, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention realizes a nanotube probe with high durability that can be manufactured in short time with less impurities adhered to the holder sustaining the nanotube. The nanotube probe according to this invention is constructed by fastening a nanotubeon the protruded portionof a cantilever by way of at least two partial coating filmsand. One or more additional partial coating films may be formed in the intermediate area between these two partial coating films. Each partial coating film is formed by irradiating electron beamon the position where the nanotubeis in contact with the protruded portionof the cantilever. The partial coating films are separated not to overlap each other. By minimizing the size of partial coating film as well as by narrowing down the beam diameter, coating time may be further shortened. With the beam diameter narrowed down, excessive deposit of impurities can be put under control.


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