The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Jan. 28, 2008
Shu-zhong Wang, Yokohama, JP;
Taiki Hoshino, Yokohama, JP;
Kimiaki Kashiwagi, Yokohama, JP;
Takashi Okazoe, Yokohama, JP;
Eisuke Murotani, Yokohama, JP;
Masahiro Ito, Yokohama, JP;
Kunio Watanabe, Yokohama, JP;
Shu-zhong Wang, Yokohama, JP;
Taiki Hoshino, Yokohama, JP;
Kimiaki Kashiwagi, Yokohama, JP;
Takashi Okazoe, Yokohama, JP;
Eisuke Murotani, Yokohama, JP;
Masahiro Ito, Yokohama, JP;
Kunio Watanabe, Yokohama, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
Adamantane derivates which can be material compounds of a polymer excellent in etching resistance and having improved transmittance to light having a short wavelength, are produced by an economically advantageous process from readily available materials. A compound (10) is subjected to esterification reaction with a compound (11) to obtain a compound (12), which is subjected to fluorination in a liquid phase to obtain a compound (13), which is then subjected to hydrolysis or alcoholysis to obtain a compound (2), which is then reacted with a compound (15) thereby to obtain a compound (1). Here, A to J are —CFH— or —CF—; Ris a perfluoroalkyl group or the like; Xis F or the like; Yis H or OH; Yis H or RCOO—; Yis H, F or RCOO—; Yis H, F, RCOO— or OH; Yis H, F, —OCOCR═CHor OH: Ris a hydrogen atom, a methyl group or the like; and Xis OH or a halogen atom: