The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Jul. 15, 2004
Jean Brun, Champagnier, FR;
Christiane Puget, Saint-Egreve, FR;
Jean Brun, Champagnier, FR;
Christiane Puget, Saint-Egreve, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
This invention relates to a process for manufacturing an anisotropic conducting film comprising a layer of electrically insulating material and conducting through inserts, the process including the following steps: a) formation on a substrate of at least one layer of material with through holes, the layer being called the perforated layer, b) filling of the through holes to form conducting inserts. The process also includes production of a mask partially covering a first end of the conducting inserts and etching of the unmasked part of the ends of the conducting inserts so as to obtain conducting inserts with pointed ends. The invention is applicable to the formation of components (chips, integrated circuits) with a high interconnections density.