The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Sep. 20, 2005
Scott G. Walton, Burke, VA (US);
Robert Meger, Crofton, MD (US);
Richard Fernsler, Annanadale, VA (US);
Darrin Leenhardt, Gaithersburg, MD (US);
Scott G. Walton, Burke, VA (US);
Robert Meger, Crofton, MD (US);
Richard Fernsler, Annanadale, VA (US);
Darrin Leenhardt, Gaithersburg, MD (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
An ion-ion plasma source, that features a processing chamber containing a large concentration of halogen or halogen-based gases. A second chamber is coupled to the processing chamber and features an electron source which produces a high energy electron beam. The high energy electron beam is injected into the processing chamber where it is shaped and confined by a means for shaping and confining the high energy electron beam. The high energy electron beam produced in the second chamber when injected into the processing chamber ionizes the halogen gas creating a dense, ion-ion plasma in the processing chamber that is continuous in time.