The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Aug. 10, 2005
Applicants:
Takashi Aoki, Suwa, JP;
Takashi Masuda, Suwa, JP;
Hideki Tanaka, Chino, JP;
Ichio Yudasaka, Chino, JP;
Inventors:
Takashi Aoki, Suwa, JP;
Takashi Masuda, Suwa, JP;
Hideki Tanaka, Chino, JP;
Ichio Yudasaka, Chino, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
An etching method of the invention includes arranging droplets including a film-forming material on a substrate, drying each of the droplets to form a dry film having a width smaller than the diameter of each droplet at the time of the arrangement, and performing etching while using the dry film as an etching protective film.