The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2009

Filed:

Dec. 05, 2005
Applicants:

Shen Wang, Webster, NY (US);

Greg L. Archer, Rochester, NY (US);

Inventors:

Shen Wang, Webster, NY (US);

Greg L. Archer, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/40 (2006.01); H04N 5/217 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention uses five regions of interest, 4 corners and 1 center to do Fourier Transform analysis to mark rough location of the streaks, if there is any. It sets the small window around the center in each Fourier Transform ROI to zero to mask the cluster of bright points caused by the lens rolloff or other noises. It use iterative linear regression to remove the random outliers and to search the best possible linear pattern. If it finds any streaks, it calculates the angle and converts it to the streak angle in spatial domain. Once a streak is detected, it can be removed by applying an inverse Fourier Transform on the processed magnitude and original phase Fourier Transform images.


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