The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Sep. 29, 2006
Kyoko Kotani, Tokyo, JP;
Kyoko Kotani, Tokyo, JP;
Oki Semiconductor Co., Ltd., Tokyo, JP;
Abstract
The manufacturing method uses a substrate including an SOI layer (), a SiOlayer () and a Si layer (). A lens surface () is formed on the surface of the SOI layer () of the substrate. A lens region including the lens surface () and an edge section () there around is formed by removing the SOI layer (), with the exception of a section corresponding to the lens region, until the SiOlayer () is exposed, such that the SOI layer () only remains in the lens region. A lens holding section () that holds the lens region is formed by removing the Si layer (), with the exception of a section of the Si layer () corresponding to the lens holding section (), until the SiOlayer () is exposed at the rear surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile