The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Nov. 14, 2006
Bryan P. Staker, Pleasanton, CA (US);
Andres Fernandez, San Francisco, CA (US);
Windsor Owens, San Francisco, CA (US);
Alexander P. Kindwall, San Francisco, CA (US);
Bryan P. Staker, Pleasanton, CA (US);
Andres Fernandez, San Francisco, CA (US);
Windsor Owens, San Francisco, CA (US);
Alexander P. Kindwall, San Francisco, CA (US);
Glimmerglass Networks, Inc., Hayward, CA (US);
Abstract
A MEMS-based mirror is provided with trenches between adjacent electrodes in order to be able to withstand relatively high applied voltages, and thus has a substantially reduced exposure to uncontrolled surface potentials. The MEMS-based mirror, thus avoids voltage drifts and has an improved mirror position stability. The trench dimensions are selected such that the voltage applied between each adjacent pair of electrodes stays within predefined limits. An insulating layer, such as silicon dioxide, electrically isolates each pair of adjacent electrodes. Each insulting layer extends partially above an associated trench and is characterized by the same height and width dimensions.