The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2009

Filed:

Oct. 09, 2003
Applicants:

Sang-gook Kim, Wayland, MA (US);

Tarek A. El Aguizy, Cambridge, MA (US);

Jeung-hyun Jeong, Cambridge, MA (US);

Yongbae Jeon, Lexington, MA (US);

Inventors:

Sang-Gook Kim, Wayland, MA (US);

Tarek A. El Aguizy, Cambridge, MA (US);

Jeung-hyun Jeong, Cambridge, MA (US);

Yongbae Jeon, Lexington, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); D02G 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for making packets of nanostructures is presented. The method includes etching trenches in a silicon substrate. Nanostructures are grown in the trenches. The trenches are then filled with a filler material. Any filler and/or nanostructures material extending beyond the trench is removed. The silicon substrate is etched away, resulting in a nanopellet surrounding the nanostructures and wherein each nanostructures has a generally uniform length and direction. Nanostructures can comprise nanotubes, nanowires and nanofibers. The method eases the manipulation of nanostructures while providing geometrical uniformity.


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