The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Aug. 17, 2007
Michael John Zani, Laguna Niguel, CA (US);
Mark Joseph Bennahmias, Mission Viejo, CA (US);
Mark Anthony Mayse, Dublin, CA (US);
Jeffrey Winfield Scott, Carpenteria, CA (US);
Michael John Zani, Laguna Niguel, CA (US);
Mark Joseph Bennahmias, Mission Viejo, CA (US);
Mark Anthony Mayse, Dublin, CA (US);
Jeffrey Winfield Scott, Carpenteria, CA (US);
NexGen Semi Holding, Inc., Laguna Niguel, CA (US);
Abstract
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.