The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2009

Filed:

Jun. 29, 2005
Applicants:

Johan Loccufier, Zwijnaarde, BE;

Luc Vanmaele, Lochristi, BE;

Roland Claes, Dendermonde, BE;

Jaymes Van Luppen, Wilrijk, BE;

Yu Chen, Tianjin, CN;

Holger Frey, Emmendingen, DE;

Inventors:

Johan Loccufier, Zwijnaarde, BE;

Luc Vanmaele, Lochristi, BE;

Roland Claes, Dendermonde, BE;

Jaymes Van Luppen, Wilrijk, BE;

Yu Chen, Tianjin, CN;

Holger Frey, Emmendingen, DE;

Assignee:

AGFA Graphics N.V., Mortsel, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A radiation curable composition comprising a novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group. Suitable radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.


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