The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2009

Filed:

Jul. 06, 2004
Applicants:

David Champion, Lebanon, OR (US);

James O'neil, Corvallis, OR (US);

Peter Mardilovich, Corvallis, OR (US);

Gregory S Herman, Albany, OR (US);

Inventors:

David Champion, Lebanon, OR (US);

James O'Neil, Corvallis, OR (US);

Peter Mardilovich, Corvallis, OR (US);

Gregory S Herman, Albany, OR (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05D 5/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for making a photonic structure, including creating a first vapor stream of a first vapor material, the first vapor stream having a first non-uniform flux in at least one direction; and moving a substrate in at least a portion of the vapor stream. In addition, the method includes depositing the first vapor material on a first major surface of said substrate, and forming a first layer and a density gradient in the first layer during deposition. The first layer is disposed on and the density gradient is in a direction perpendicular to the first major surface.


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