The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2009

Filed:

Sep. 26, 2007
Applicants:

Yukio Taniguchi, Yokohama, JP;

Masakiyo Matsumura, Yokohama, JP;

Hirotaka Yamaguchi, Yokohama, JP;

Mikihiko Nishitani, Yokohama, JP;

Susumu Tsujikawa, Yokohama, JP;

Yoshinobu Kimura, Yokohama, JP;

Masayuki Jyumonji, Yokohama, JP;

Inventors:

Yukio Taniguchi, Yokohama, JP;

Masakiyo Matsumura, Yokohama, JP;

Hirotaka Yamaguchi, Yokohama, JP;

Mikihiko Nishitani, Yokohama, JP;

Susumu Tsujikawa, Yokohama, JP;

Yoshinobu Kimura, Yokohama, JP;

Masayuki Jyumonji, Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A crystallization apparatus includes an illumination system which applies illumination light for crystallization to a non-single-crystal semiconductor film, and a phase shifter which includes first and second regions disposed to form a straight boundary and transmitting the illumination light from the illumination system by a first phase retardation therebetween, and phase-modulates the illumination light to provide a light intensity distribution having an inverse peak pattern that light intensity falls in a zone of the non-single-crystal semiconductor film containing an axis corresponding to the boundary. The phase shifter further includes a small region which extends into at least one of the first and second regions from the boundary and transmits the illumination light by a second phase retardation with respect to the at least one of the first and second regions.


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