The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2009
Filed:
Jan. 21, 2005
Keun-ho Jang, Seoul, KR;
Hyun-gue Kim, Seoul, KR;
Keun-Ho Jang, Seoul, KR;
Hyun-Gue Kim, Seoul, KR;
Samsung Mobile Display Co., Ltd., Suwon, KR;
Abstract
An apparatus and method for inspecting polycrystalline silicon (Poly-Si) that illuminates light onto protrusions in the Poly-Si in order to determine a distance between them using intensity and reflection angle of reflected light. The Poly-Si inspection apparatus includes a light source that illuminates light, and a reflected light detector for receiving reflected light, wherein a distance between protrusions is measured by an incident angle of the light illuminated into the protrusion from the light source, a detection angle of the reflected light detector, and a wavelength of the detected reflected light.