The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2009
Filed:
Sep. 02, 2005
Applicant:
Tomoya Sasaki, Shizuoka, JP;
Inventor:
Tomoya Sasaki, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract
A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the resist composition are provided, which are a positive resist composition comprising (A) a resin which becomes soluble in alkali developer increases under the action of an acid, the resin having two kinds of repeating units each having a specific styrene skeleton, (B) a compound of generating an acid upon irradiation with actinic rays or radiation, and (C) an organic basic compound, and a pattern forming method using the resist composition.