The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Feb. 10, 2005
Tatsuhiro Kobayashi, Tokyo, JP;
Koji Mishima, Tokyo, JP;
Tatsuhiro Kobayashi, Tokyo, JP;
Koji Mishima, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
According to the invention, a record mark is formed by: using one ON-pulse pattern and one ON-pulse pattern following it when the record mark to be formed is shorter than a specified length X (nT<X); and using two ON-pulse patterns and two ON-pulse patterns respectively following them when the record mark to be formed is longer than the specified length X (nT>X). This makes is possible to secure a heat amount per unit time sufficiently in forming a short record mark even when a targeted recording linear velocity is high. Also, an unwanted heat pocket becomes hard to arise in the record layer even when a sufficient heat amount per unit time is secured in forming a long record mark. Therefore, it becomes possible to form a record mark having a good shape even when data is recorded at a high linear velocity.