The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Nov. 12, 2007
Tsai Hau Hong, Hsinchu, TW;
Tze Chia Lin, Hsinchu, TW;
Ming Hsien Chou, Hsinchu, TW;
HC Photonics Corp., Hsinchu, TW;
Abstract
A method for preparing a poled structure forms a ferroelectric substrate with a first polarization direction, wherein the ferroelectric substrate has a first surface and a second surface. An electrode-patterning process is then performed to form a first electrode structure on the first surface, and the first electrode structure includes a plurality of active blocks and a plurality of passive blocks, wherein at least one passive block is sandwiched between two active blocks. Subsequently, a poling process is performed including applying a predetermined voltage to the active blocks and floating the passive blocks such that a current such as a leakage current or a tunnel current is generated from the active blocks to the passive blocks to form a plurality of inverted domains with a second polarization direction in the ferroelectric substrate.