The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Jul. 07, 2006
Jörg Angermann, Sargans, CH;
Peter Burtscher, Rankweil, AT;
Urs Karl Fischer, Arbon, CH;
Norbert Moszner, Triesen, LI;
Volker M. Rheinberger, Vaduz, LI;
Jörg Angermann, Sargans, CH;
Peter Burtscher, Rankweil, AT;
Urs Karl Fischer, Arbon, CH;
Norbert Moszner, Triesen, LI;
Volker M. Rheinberger, Vaduz, LI;
Ivoclar Vivadent AG, Schaan, LI;
Abstract
Dental materials and associated methods are described based on multicyclic allyl sulphides with general Formula (I): in which Ris H or a C-Calkyl radical; Ris H or a C-Calkyl radical; Ris absent or is a C-Calkylene radical which can be interrupted by O or S, a cycloaliphatic C-Cradical, a bicyclic C-Cradical, a C-Carylene or C-Calkylene arylene radical; Ris an n-times substituted aliphatic Cto Chydrocarbon radical which can be interrupted by O or S, a cycloaliphatic C-Cradical, an aromatic C-Cradical, an aliphatic-aromatic C-Cradical or a heterocyclic radical which can contain 4 to 20 carbon atoms and 1 to 6 heteroatoms which are selected from N, O, P and/or S atoms, or which is formed exclusively by these heteroatoms; Ris absent or is a C-Calkylene radical; X is absent or is O, S, —O—CO— or —O—CO—NH—; Y is absent or is O, S, —O—CO— or —O—CO—NH—; m is 0 or 1 and n is an integer from 3 to 6.