The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Jun. 05, 2003
Applicants:
Takaya Nakabayashi, Ayama-gun, JP;
Akiyoshi Fujii, Nara, JP;
Inventors:
Takaya Nakabayashi, Ayama-gun, JP;
Akiyoshi Fujii, Nara, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); G03F 1/00 (2006.01); B41J 2/01 (2006.01); H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern formation substrate comprising a substrate having thereon a hydrophobic region exhibiting repellency to liquid drops and a hydrophilic line exhibiting affinity with liquid drops. The hydrophilic line has such a surface treatment that upon landing of a liquid drop thereon, the liquid drop moves in the arrowed direction. Thus, attachment of liquid drops to regions to which liquid drops should not be adhered can be prevented, thereby enabling forming a pattern of desired characteristics.