The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2009

Filed:

Oct. 30, 2006
Applicants:

Venkat Selvamanickam, Wynantskill, NY (US);

Yijie LI, Niskayuna, NY (US);

Chan Park, Kyung-Nam, KR;

Inventors:

Venkat Selvamanickam, Wynantskill, NY (US);

Yijie Li, Niskayuna, NY (US);

Chan Park, Kyung-Nam, KR;

Assignee:

Superpower, Inc., Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method includes feeding an uncoated substrate from a payout spool into a multi-chambered vacuum apparatus. The vacuum apparatus includes a plurality of deposition chambers defining an extended deposition zone, a multi-zone substrate heater located within the extended deposition zone, and multiple high-temperature superconductor (HTS) targets located within and being arranged linearly along the extended deposition zone. The multiple HTS targets include a first and second HTS target. The first and second HTS targets include a HTS material. The method farther includes translating the uncoated substrate along a translation path through the plurality of deposition chambers, impinging multiple laser beams simultaneously upon the multiple HTS targets and forming multiple overlapping plumes of HTS material within the extended deposition zone, depositing HTS material on a first major surface of the uncoated substrate to provide a coated substrate, and winding the coated substrate onto a take-up spool.


Find Patent Forward Citations

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Selvamanickam, Venkat. (2009). High throughput continuous pulsed laser deposition process (U.S. Patent No. 7501145). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7501145

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