The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2009

Filed:

Apr. 02, 2007
Applicants:

Claudia Wiegand, Darmstadt, DE;

Rudolf Rhein, Heppenheim, DE;

Eberhard Tempel, Seeheim-Jugenheim, DE;

Inventors:

Claudia Wiegand, Darmstadt, DE;

Rudolf Rhein, Heppenheim, DE;

Eberhard Tempel, Seeheim-Jugenheim, DE;

Assignee:

BASF Aktiengesellschaft, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention relates to etching solutions which comprise hydrofluoric acid and organic solvents for use in the process for the production of integrated circuits. The etching solutions according to the invention are particularly suitable for the selective etching of doped silicate layers.


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