The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Apr. 11, 2005
Wen-chien Hsiao, San Jose, CA (US);
Terence Lam, Cupertino, CA (US);
Yinshi Liu, Foster City, CA (US);
Michael Yang, San Jose, CA (US);
Samuel Yuan, Saratoga, CA (US);
Wen-Chien Hsiao, San Jose, CA (US);
Terence Lam, Cupertino, CA (US);
Yinshi Liu, Foster City, CA (US);
Michael Yang, San Jose, CA (US);
Samuel Yuan, Saratoga, CA (US);
Hitachi Global Storage Technologies, Netherlands B.V., Amsterdam, NL;
Abstract
Embodiments of the present invention recite a process for fabricating a write gap structure for a magnetic recording head. In one embodiment, at least one layer of inert material is deposited which is disposed proximate to the Ppole of a magnetic recording head. A layer of magnetic material is deposited which is disposed between the layer of inert material and the Ppedestal (PP) of the magnetic recording head. In embodiments of the present invention, a second layer of inert material is deposited which is disposed between the layer of magnetic material and the PP of the magnetic recording head. In embodiments of the present invention, the throat height of the write gap structure is defined wherein the layer of magnetic material and the inert layer only overlie a portion of the Ppedestal of the magnetic recording head.